EULITHA provides nanopatterning for a wide variety of applications, based on its innovative PHABLE™ technology, e-beam lithography etc.
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Eul●●● AG
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SWITZERLAND
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EULITHA - Photolithography Equipment, Nanoimprint Templates, Silicon - Quartz - Nickel Stamps, PHABLE | eulitha.com Reviews
https://eulitha.com
EULITHA provides nanopatterning for a wide variety of applications, based on its innovative PHABLE™ technology, e-beam lithography etc.
eulitha.com
EUV Gratings - EULITHA
http://www.eulitha.com/products/euv-gratings
We offer EUV transmission diffraction gratings with periods down to 50 nm patterned on thin silicon or silicon nitride membranes. Our years of experience on EUV-IL have led to many improvements in the design and manufacturing of these high specialty devices. Our diffraction gratings are used in EUV spectroscopy and lithography setups. We provide help with optimum gratings design for your application. Click here to download our flyer on EUV gratings. Pingping Zhang et al 2014 Nanotechnology 25 245301.
Standard Patterns - EULITHA
http://www.eulitha.com/products/standard-patterns
Eulitha specializes in the manufacturing of nanostructures with the most advanced lithography methods that include our unique PHABLE technology and electron beam lithography. The PHABLE technology enables coverage of large areas with photonic nanostructures. We offer a standard line of 1D and 2D periodic nanostructures products made with PHABLE and e-beam lithography. These patterns can be used as Nanoimprint Templates or directly in other research and development projects. 41 56 281 21 52 via email.
Careers - EULITHA
http://www.eulitha.com/company/careers
Thank you for your interest. Eulitha is always on the lookout for new talent. Please send your resume to the following address for consideration. 41 56 281 21 52 via email. Or follow us at.
PHABLE™ Made Nanostructures - EULITHA
http://www.eulitha.com/products/standard-patterns/phable-made
PHABLE - MADE STANDARD PATTERNS. Eulitha’s photonic templates are made with its revolutionary PHABLE technology, which guarantees highest quality at an affordable price. Optimized silicon and quartz etching yields hole and pillar patterns with a slight positive slope that facilitates the imprint process. Standard templates with square and hexagonal lattices as well as linear gratings are available. Multi-Resolution Linear Grating Combinations. Multi-Lattice Multi-Resolution Combination Mold. 75nm / - -.
Custom Patterning - EULITHA
http://www.eulitha.com/products/custom-patterning
Eulitha offers e-beam patterning services to academic and industrial customers for either direct use in experiments and devices or for production of replication templates. Typical production cycle involves the following steps:. Specification of customer requirements, e.g. substrate, pattern layout, resolution, feature height and profile. Proposal from Eulitha including alternative approaches in consideration of quality, cost and manufacturability. Characterization (e.g. SEM, optical microscopy). Nanoimpr...
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MNE 2014 | Micro and Nano Engineering, 40th edition – Lausanne, Switzerland - MEE
http://www.mne2014.org/mee
With the support of:. Open call for papers for four special issues of. Associated with the 40th Micro and Nano Engineering,. Micro/Nano Lithography with Photons, Electrons and Ions 2014. Micro/Nano Devices and Systems 2014. Micro/Nano Biotechnologies and Systems 2014. Manuscript submission deadline: 24 October, 2014. Please submit papers directly on the MEE journal submission web page [the submission opens on 24 September, 2014] and select the correct special issue. Review papers (7-10 pages) are encoura...
MNE 2014 | Micro and Nano Engineering, 40th edition – Lausanne, Switzerland - About Lausanne
http://www.mne2014.org/Lausanne.php
With the support of:. Lausanne is also known as the Olympic Capital. Being headquarters to the International Olympic Committee (IOC), as well as being an internationally well-known cultural center. Unesco World Heritage Site - Lavaux Vineyards. Olympic Museum and IOC Headquarters. Interested in sponsoring MNE and seeing your logo here? To our mailing list to receive all announcements. 2014 Web site by the FSRM. Last update on Sept 11, 2014.
MNE 2014 | Micro and Nano Engineering, 40th edition – Lausanne, Switzerland - Opening Welcome Session
http://www.mne2014.org/opening.php
With the support of:. MNE 2014 Opening / Welcome Session. Tuesday, September 23, 2014. STCC, Plenary Lecture Hall. 08:30 – 09:00. Michel Despont (CSEM) and Juergen Brugger (EPFL). MNE 2014 General Chairs. Office for Economic Affairs, Canton of Vaud. Vice Presidency for Academic Affairs (EPFL). Laura Heyderman (PSI/ETHZ) and Guillermo Villanueva (EPFL). MNE 2014 Program Chairs. Interested in sponsoring MNE and seeing your logo here? To our mailing list to receive all announcements.
MNE 2014 | Micro and Nano Engineering, 40th edition – Lausanne, Switzerland - Social Program
http://www.mne2014.org/social.php
With the support of:. MNE 2014 Social Program. In order to facilitate quality networking and relaxation we are delighted to propose the following social program at MNE 2014. Monday, September 22 - Welcome Reception. 17:00 – 19:00. Join us for a welcome drink and catch up with friends and colleagues. The Registration Desk will also be open so this will be a good time to check-in and pick up your badge. Wednesday, September 24 - Boat Cruise and Conference Banquet *. 17:00 – 23:00. 12:30 – 13:00. Join us in...
MNE 2014 | Micro and Nano Engineering, 40th edition – Lausanne, Switzerland - Organising Committees
http://www.mne2014.org/committees.php
With the support of:. MNE 2014 Local Organising Committee. CSEM) - Conference Co-Chair. EPFL) - Conference Co-Chair. PSI/ETHZ) - Program Chair. EPFL) - Program Co-Chair. ETHZ) - Program Co-Chair. FSRM) – General secretary, web site and communications. EPFL) – Exhibition Management. Mimotec) – Short Courses. EPFL / P / P-SG / Médiacom) – Social Program and Catering. MNT Consult) - Sponsoring. IBM Research) - Start-up Contest. MNE International Steering Committee. CSEM – Switzerland. Victor J. Cadarso.
MNE 2014 | Micro and Nano Engineering, 40th edition – Lausanne, Switzerland - Technical Program
http://www.mne2014.org/program.php
With the support of:. MNE 2014 Technical Program. The technical program for MNE 2014 is now available. Invited speakers and Plenary talks. Detailed list of poster presentations. Detailed list of oral presentations. Participants are reminded that you can build a personalised schedule. For the conference using the ePapers MySchedule tool. You can use this link to do so. Registration reminder for authors. Presentations are allotted 12 minutes for the presentation. PLEASE NOTE THAT PRESENTERS MUST BRING A US...
MNE 2014 | Micro and Nano Engineering, 40th edition – Lausanne, Switzerland - Conference Scope
http://www.mne2014.org/scope.php
With the support of:. Scope of the conference. The MNE Conference will address questions concerning micro and nano-fabrication and manufacturing employing lithography and other patterning related approaches, and the use of the resulting structures and devices for scientific research and technological applications. The themes will include:. Photon, Electron and Ion-Based Lithography. Chair – Emanuel Loertscher. Electron and ion beam lithography:. Resists for beam based lithography:. Pattern transfer and p...
MNE 2014 | Micro and Nano Engineering, 40th edition – Lausanne, Switzerland - MNE Fellowship Award
http://www.mne2014.org/micrograph.php
With the support of:. MNE micro and nano - graph Contest. Sponsored annually by Zyvex Labs. The traditional micro and nano-graph contest is now open for entries ( deadline September 15. For full information, please refer to this page. On the Zyvex Labs web site [ link. The MNE micro and nano - graph Contest is sponsored by:. Interested in sponsoring MNE and seeing your logo here? To our mailing list to receive all announcements. 2014 Web site by the FSRM. Last update on Sept 11, 2014.
MNE 2014 | Micro and Nano Engineering, 40th edition – Lausanne, Switzerland - MEE
http://www.mne2014.org/mee.php
With the support of:. Open call for papers for four special issues of. Associated with the 40th Micro and Nano Engineering,. Micro/Nano Lithography with Photons, Electrons and Ions 2014. Micro/Nano Devices and Systems 2014. Micro/Nano Biotechnologies and Systems 2014. Manuscript submission deadline: 24 October, 2014. Please submit papers directly on the MEE journal submission web page [the submission opens on 24 September, 2014] and select the correct special issue. Review papers (7-10 pages) are encoura...
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EULITHA - Photolithography Equipment, Nanoimprint Templates, Silicon - Quartz - Nickel Stamps, PHABLE
Leading expertise in nano-lithography. High resolution and fidelity. Large area structures made by PHABLE technology. PhableR 100 - New exposure system. Resolution of a stepper - Simplicity of a mask aligner. Next generation nano patterning. Unique full-field exposure system for non-contact patterning of wafers. Large-area nano patterns made by PHABLE and E-beam. Made by E-beam, PHABLE and other lithography technologies. Gratings on thin membranes for lithography and spectroscopy. News And Upcoming Events.
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