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ARO-MURI T2SL Home

Task 1: Theoretical & Experimental Study of Defects. Task 2: Innovative Growth and Fabrication Processes for Defect Reduction. Task 3: Evaluation of Defect Reduction Approaches and Device Applications. 2011 Annual Review (Restricted). 2013 Annual Review (Restricted). 2014 Annual Review (Restricted). 2015 Annual Review (Restricted). Fundamental Study of Defects and Their Reduction in Type-II Superlattice Materials. Army Research Office, MURI Program. Dr William Clark, Electronics Division.

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ARO-MURI T2SL Home | muri-t2sl.ece.illinois.edu Reviews
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Task 1: Theoretical & Experimental Study of Defects. Task 2: Innovative Growth and Fabrication Processes for Defect Reduction. Task 3: Evaluation of Defect Reduction Approaches and Device Applications. 2011 Annual Review (Restricted). 2013 Annual Review (Restricted). 2014 Annual Review (Restricted). 2015 Annual Review (Restricted). Fundamental Study of Defects and Their Reduction in Type-II Superlattice Materials. Army Research Office, MURI Program. Dr William Clark, Electronics Division.
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KEYWORDS
1 links
2 home page
3 investigator profiles
4 project overview
5 broader impact
6 kickoff meeting
7 kickoff documents restricted
8 annual reports restricted
9 program managers
10 uiuc lead
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links,home page,investigator profiles,project overview,broader impact,kickoff meeting,kickoff documents restricted,annual reports restricted,program managers,uiuc lead,georgia tech,r d dupuis,uncc,y zhang
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ARO-MURI T2SL Home | muri-t2sl.ece.illinois.edu Reviews

https://muri-t2sl.ece.illinois.edu

Task 1: Theoretical & Experimental Study of Defects. Task 2: Innovative Growth and Fabrication Processes for Defect Reduction. Task 3: Evaluation of Defect Reduction Approaches and Device Applications. 2011 Annual Review (Restricted). 2013 Annual Review (Restricted). 2014 Annual Review (Restricted). 2015 Annual Review (Restricted). Fundamental Study of Defects and Their Reduction in Type-II Superlattice Materials. Army Research Office, MURI Program. Dr William Clark, Electronics Division.

INTERNAL PAGES

muri-t2sl.ece.illinois.edu muri-t2sl.ece.illinois.edu
1

ARO-MURI T2SL: Broader Impact

http://muri-t2sl.ece.illinois.edu/BroaderImpact.html

Task 1: Theoretical & Experimental Study of Defects. Task 2: Innovative Growth and Fabrication Processes for Defect Reduction. Task 3: Evaluation of Defect Reduction Approaches and Device Applications. 2011 Annual Review (Restricted). Impact on DoD capabilities. IR materials and devices have tremendous importance to DoD applications and capabilities. Infrared III-V T2SLs offer complementary advantages over the state-of-the-art narrow bandgap semiconductors such as HgCdTe. Research Training of Students.

2

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http://muri-t2sl.ece.illinois.edu/AnnualReview2015.php

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ARO-MURI T2SL Overview

http://muri-t2sl.ece.illinois.edu/Overview.html

Task 1: Theoretical & Experimental Study of Defects. Task 2: Innovative Growth and Fabrication Processes for Defect Reduction. Task 3: Evaluation of Defect Reduction Approaches and Device Applications. Given the motivation for this project, the main objectives are:. Identify and understand the origin of point defects, line defects, interfacial traps, and surface states in T2SL structures through experimental studies closely coupled to theoretical modeling. Study surfactant mediated growth, graded interfa...

4

ARO-MURI T2SL: Task 3

http://muri-t2sl.ece.illinois.edu/ARO-MURI%20T2SL%20%20Task%203.html

Task 1: Theoretical & Experimental Study of Defects. Task 2: Innovative Growth and Fabrication Processes for Defect Reduction. Task 3: Evaluation of Defect Reduction Approaches and Device Applications. 2011 Annual Review (Restricted). Task 3: Evaluation of Defect Reduction Approaches and Device Applications. Task Leader: Yong Zhang. Measurements to evaluate the effectiveness of defect reduction techniques;. Evaluation of defect reduction through device application. J Li, and S. L. Chuang, JAP.

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nano.illinois.edu nano.illinois.edu

Associated Centers | Nano @ Illinois

http://nano.illinois.edu/collaboration/centers.html

Nanoscale Chemical-Electrical-Mechanical Manufacturing Systems (Nano-CEMMS)*. Theme: Nanoscale Manufacturing System. Thrusts include: Micro-Nano Fluidic Network Toolkit, Process Sensing and Control, Manufacturing Systems, and Applications. School of Chemical Sciences. Theme: Nanoscale Chemical Analysis and Devices. Thrusts include: Active control of interfacial chemistry and morphology, as an entrée to developing nanoscale chemical devices for sensing, separations, and signal processing. Materials Comput...

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ARO-MURI T2SL Home

Task 1: Theoretical & Experimental Study of Defects. Task 2: Innovative Growth and Fabrication Processes for Defect Reduction. Task 3: Evaluation of Defect Reduction Approaches and Device Applications. 2011 Annual Review (Restricted). 2013 Annual Review (Restricted). 2014 Annual Review (Restricted). 2015 Annual Review (Restricted). Fundamental Study of Defects and Their Reduction in Type-II Superlattice Materials. Army Research Office, MURI Program. Dr William Clark, Electronics Division.

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